Encyclopedia Materials Materials Photoresist Resolution From Jcost
ARTICLE 5 claims 2 theorems 1 measured
Materials Photoresist Resolution From Jcost
Photoresist resolution in chip lithography has a classical formula; the Recognition Science framework contributes a theoretical floor for one of its factors.
Resolution limits
Photoresist resolution is the smallest feature a lithography process can print, and the standard way to state it is the Rayleigh criterion: R = k1 × λ / NA, where λ is the wavelength of the exposing light, NA is the numerical aperture of the optics, and k1 is a dimensionless factor that captures how well the whole process uses the optical system. In production extreme ultraviolet (EUV) lithography, k1 sits in a band from about 0.3 to 0.5, limited by resist chemistry, optics, and mask effects. The classical formula is a definitional model: it organizes the contributors to resolution, but it does not by itself say what the smallest possible k1 is.
The Recognition Science framework derives a theoretical lower bound for k1 from its cost function. In this account, the recognition-limited lithography factor is k1 = J(φ)/2 ≈ 0.059, where J is the framework's cost function and φ is the golden ratio. That value is a floor: it is what the framework's recognition ledger would permit if practical constraints vanished. The gap between 0.059 and the empirical 0.3 to 0.5 is large, and the framework does not claim to close it; the gap is where real resist chemistry and optics live.
What the machine-checked library actually proves about this subject is deliberately modest. The module defines domainCost, a discrete record of cost, as J(m/e), the cost function applied to the ratio of two real numbers m and e. Three general facts are proved: the cost is zero when m equals e, the cost is nonnegative for positive inputs, and the threshold φ − 3/2 is positive. These are true for any positive real numbers; the module proves nothing specific to photoresists, because m and e are not defined in resist terms. The research note in the file says plainly that the subject-specific claim is where the idea was meant to go, not a result that has landed.
The honest takeaway is that the framework offers a candidate theoretical floor for k1, but the module itself is a template. What would turn it into a theorem about photoresists is a definition of m and e in resist terms, for example a model of exposure dose and threshold. Until that definition exists, the 0.059 value is a prediction with a named falsifier: a measured k1 below that floor in a real process would refute it. No such measurement exists.
MEASURED cert · IndisputableMonolith/Materials/PhotoresistResolution_FromJCost.lean
noncomputable def cert : PhotoresistResCert where
cost_at_eq := domainCost_at_eq
cost_nonneg := domainCost_nonneg
threshold_pos := canonicalThreshold_pos
HYPOTHESIS cert · IndisputableMonolith/Materials/PhotoresistResolution_FromJCost.lean
noncomputable def cert : PhotoresistResCert where
cost_at_eq := domainCost_at_eq
cost_nonneg := domainCost_nonneg
threshold_pos := canonicalThreshold_pos
THEOREM domainCost · domainCost_at_eq · domainCost_nonneg · canonicalThreshold_pos · IndisputableMonolith/Materials/PhotoresistResolution_FromJCost.lean
def domainCost (m e : ℝ) : ℝ := Jcost (m / e)
theorem domainCost_at_eq (r : ℝ) (h : r ≠ 0) : domainCost r r = 0 := by
unfold domainCost; rw [div_self h]; exact Jcost_unit0
theorem domainCost_nonneg (m e : ℝ) (hm : 0 < m) (he : 0 < e) : 0 ≤ domainCost m e := by
unfold domainCost; exact Jcost_nonneg (div_pos hm he)
theorem canonicalThreshold_pos : 0 < canonicalThreshold := by
unfold canonicalThreshold; linarith [phi_gt_onePointFive]
THEOREM domainCost · IndisputableMonolith/Materials/PhotoresistResolution_FromJCost.lean
def domainCost (m e : ℝ) : ℝ := Jcost (m / e)
What this page does not claim
The framework proves a photoresist-specific resolution limit. The 0.059 value is an achieved or achievable process result. The Rayleigh criterion itself is derived from the framework.
Verify this page
Every tagged claim above names its theorem. To check one yourself rather than trust this page, elaborate the source module with Lean 4 and audit its axiom basis:
$ lake env lean IndisputableMonolith/Materials/PhotoresistResolution_FromJCost.lean
expected axiom basis: [propext, Classical.choice, Quot.sound] (the Lean kernel's standard three; no RS-specific axioms)
A page whose claims cannot be reproduced this way does not ship. In production, every anchor links to the exact declaration in the public source release, and this block carries the build receipt for the page itself.
Derived articles
This page is generated by a question-recursion engine: the questions its answers raise become the next pages. The current agenda, with open targets marked red:
- What definition of m and e in resist terms would turn the template into a subject-specific theorem?
- What practical constraint contributes most to the gap between the theoretical floor and empirical k1?
- Does the framework's cost function have a derivation that connects it to optical imaging theory?
- How would a measured k1 below 0.059 be distinguished from a measurement artifact?
MACHINE LAYER · GROUNDED CLAIM TABLE · CLICK TO EXPAND
- MODELThe classical Rayleigh criterion is R = k1 × λ / NA, where λ is the wavelength and NA is the numerical aperture.
MEASURED cert · IndisputableMonolith/Materials/PhotoresistResolution_FromJCost.lean
noncomputable def cert : PhotoresistResCert where cost_at_eq := domainCost_at_eq cost_nonneg := domainCost_nonneg threshold_pos := canonicalThreshold_posIn production EUV lithography, k1 sits in a band from about 0.3 to 0.5. cert · IndisputableMonolith/Materials/PhotoresistResolution_FromJCost.leanHYPOTHESIS cert · IndisputableMonolith/Materials/PhotoresistResolution_FromJCost.lean
noncomputable def cert : PhotoresistResCert where cost_at_eq := domainCost_at_eq cost_nonneg := domainCost_nonneg threshold_pos := canonicalThreshold_posThe framework derives a theoretical lower bound for k1 as k1 = J(φ)/2 ≈ 0.059. cert · IndisputableMonolith/Materials/PhotoresistResolution_FromJCost.leanTHEOREM domainCost · domainCost_at_eq · domainCost_nonneg · canonicalThreshold_pos · IndisputableMonolith/Materials/PhotoresistResolution_FromJCost.lean
def domainCost (m e : ℝ) : ℝ := Jcost (m / e)theorem domainCost_at_eq (r : ℝ) (h : r ≠ 0) : domainCost r r = 0 := by unfold domainCost; rw [div_self h]; exact Jcost_unit0theorem domainCost_nonneg (m e : ℝ) (hm : 0 < m) (he : 0 < e) : 0 ≤ domainCost m e := by unfold domainCost; exact Jcost_nonneg (div_pos hm he)theorem canonicalThreshold_pos : 0 < canonicalThreshold := by unfold canonicalThreshold; linarith [phi_gt_onePointFive]The module defines domainCost as J(m/e) and proves it vanishes when m equals e, is nonnegative on positive inputs, and that φ − 3/2 is positive. domainCost · domainCost_at_eq · domainCost_nonneg · canonicalThreshold_pos · IndisputableMonolith/Materials/PhotoresistResolution_FromJCost.leanTHEOREM domainCost · IndisputableMonolith/Materials/PhotoresistResolution_FromJCost.lean
def domainCost (m e : ℝ) : ℝ := Jcost (m / e)The module proves nothing specific to photoresists because m and e are not defined in resist terms. domainCost · IndisputableMonolith/Materials/PhotoresistResolution_FromJCost.lean